This paper focuses on the study of micro-galvanic corrosion of the Cu/Ru couple in KIO4 solution. Practical nobility across the Cu/Ru interface was evaluated by Volta potential mapping, and the morphological changes were monitored by in-situ atomic force microscopy measurements during exposure in a KIO4 solution. Chemical composition of precipitated corrosion product was analyzed by Confocal Raman spectroscopy immediately after the exposure. The results show that Cu is the anode of the Cu/Ru couple, and accelerated dissolution of Cu preferentially occurs near the Cu/Ru interface. However, subsequent formation of insoluble Cu(IO3)(2)center dot nH(2)O leads to precipitation, which impedes further Cu corrosion.