Graphene nanoribbons grown in hBN stacks for high-performance electronics

Van der Waals encapsulation of two-dimensional materials in hexagonal boron nitride (hBN) stacks is a promising way to create ultrahigh-performance electronic devices1,2,3,4. However, contemporary approaches for achieving van der Waals encapsulation, which involve artificial layer stacking using mechanical transfer techniques, are difficult to control, prone to contamination and unscalable. Here we report the transfer-free direct growth of high-quality graphene nanoribbons (GNRs) in hBN stacks. The as-grown embedded GNRs exhibit highly desirable features being ultralong (up to 0.25 mm), ultranarrow (<5 nm) and homochiral with zigzag edges. Our atomistic simulations show that the mechanism underlying the embedded growth involves ultralow GNR friction when sliding between AA′-stacked hBN layers. Using the grown structures, we demonstrate the transfer-free fabrication of embedded GNR field-effect devices that exhibit excellent performance at room temperature with mobilities of up to 4,600 cm2 V–1 s–1 and on–off ratios of up to 106. This paves the way for the bottom-up fabrication of high-performance electronic devices based on embedded layered materials.

相关文章

  • Probing picometre-scale interlayer deformations via hyperbolic polaritons
    [Shu Zhang, Xiangdong Guo, Xiaowen Zhang, Jiashu Yang, Qinzheng Yu, Zhengyang Mou, Bingze Wu, Chenchen Wu, Shiyu Yang, Yongxin Lan, Peiyi He, Jing Shi, Kaijun Feng, Yuxiang Gao, Qiang Zheng, Shuang Zhang, F. Javier García de Abajo, Zhipei Sun, Mingguang Yao, Feng Ding, Peng Gao, Xiaoxia Yang, Qing Dai]
  • In-plane anomalous Hall effect in a low-dimensional system
    [I-Hsuan Kao, Ravi Kumar Bandapelli, Zhenhong Cui, Shuchen Zhang, Jian Tang, Tiema Qian, Souvik Sasmal, Aalok Tiwari, Mei-Tung Chen, Raghvendra Posti, Rahul Rao, Jiahan Li, James H. Edgar, Kenji Watanabe, Takashi Taniguchi, Ni Ni, Su-Yang Xu, Qiong Ma, Shubhayu Chatterjee, Jyoti Katoch, Simranjeet Singh]
  • Layer photovoltaic effect in a two-dimensional antiferromagnet with parity–time symmetry
    [Yu Dong, Sota Kitamura, Yuki M. Itahashi, Daniel G. Chica, Shingo Toyoda, Kenji Watanabe, Takashi Taniguchi, Miuko Tanaka, Xavier Roy, Naoki Ogawa, Takahiro Morimoto, Yoshihiro Iwasa, Toshiya Ideue]
  • qq

    成果名称:低表面能涂层

    合作方式:技术开发

    联 系 人:周老师

    联系电话:13321314106

    ex

    成果名称:低表面能涂层

    合作方式:技术开发

    联 系 人:周老师

    联系电话:13321314106

    yx

    成果名称:低表面能涂层

    合作方式:技术开发

    联 系 人:周老师

    联系电话:13321314106

    ph

    成果名称:低表面能涂层

    合作方式:技术开发

    联 系 人:周老师

    联系电话:13321314106

    广告图片

    润滑集