This study proposes a novel nitrogen gradient regulation strategy to mitigate wear on silicon nitride ceramic bearings under dynamic loading or impact. Gradient TiN films are deposited on silicon nitride ceramics using magnetron sputtering, with nitrogen flow rates dynamically optimized and regulated between 15 and 25 sccm. The phase composition and microstructure of TiN films with varying nitrogen gradients were analyzed using X-ray diffraction (XRD) and scanning electron microscopy (SEM). Film-substrate adhesion, as well as friction and wear properties, were evaluated via scratch and friction tests. Under identical experimental conditions, the gradient thin film exhibits finer and denser grains compared to the single-layer thin film. The hardness of the gradient thin film shows a slight increase, while its film-substrate adhesion is approximately 1.5 times greater than that of the single-layer counterpart. Notably, the TiN gradient thin film with a nitrogen gradient of 0.8 sccm/5 min achieves the highest film-substrate adhesion, with an LC2 value of 26.45 N. The gradient TiN film exhibits a significantly reduced friction coefficient and wear rate compared to the silicon nitride substrate and single-layer TiN film. Specifically, the TiN gradient film with a nitrogen gradient of 0.8 sccm/5 min achieves the lowest friction coefficient of 0.09 and a wear rate of 2.29 × 10−6 mm3/ (m·N). The gradient structure design notably enhances bonding strength while reducing friction and wear rate. This strategy significantly improves the substrate material’s wear resistance.