Molybdenum disulfide films have excellent friction and anticorrosion properties, but when applied to moving parts in semiconductor processing equipment, plasmas can damage films and reduce lubrication efficiency. However, the effect of high energy and strong oxidizing CF 4 plasmas on the tribological performance of MoS 2 films has not been systematically studied. Herein, MoS 2 films fabricated by magnetron sputtering are treated with CF 4 plasma generated by an ion source to produce fluorine-doped MoS 2. The film has a layered structure, and the interlayer distance is reduced by the CF 4 plasma treatment. The films treated for 30 min have the optimal mechanical and tribological performance. This results in a wear rate of 3.7925 × 10 7 mm 3/(N∙m) and an average COF of 0.0234, which are 53 % and 40 % lower, respectively, than the untreated film. Experiments and simulations reveal that incorporating F from the plasma passivates S vacancies in the MoS 2 film, reduces the interlayer distance, enhances the mechanical performance of MoS 2, and forms a low-friction F-containing MoS 2 surface with superior friction and wear performance. The effects and mechanism of CF 4 plasma treatment on the lubrication performance in MoS 2 films are studied to provide insights into the design of advanced lubricating materials resistant to plasma-induced damage.